Application requirements
In the low-pressure (0,1 mbar) plasma polymerisation process at Empa, the liquid silicon-organic compound hexamethyldisiloxane (HMDSO - C6H18OSi2) is evaporated and successively activated by the plasma with the aim to be polymerised and deposited onto the fiber surface as a hydrophobic coating. In order to obtain a stable and reproducible polymer precursor vapour flow, the liquid HMDSO flow as well as a carrier gas flow have to be controlled accurately. The HMDSO vapour is introduced into the plasma chamber at defined flow rates, where high rates promote high deposition rates and fast processing.