Application requirements
The aluminium oxide deposition process inside a vacuum reactor using oxygen and trimethylaluminium (TMA) as precursor is highly sensitive, and needs to occur under very dry and clean conditions, to prevent premature reaction of TMA. To this end, the argon carrier gas needs to be very pure - grade 6.0 or better. Moreover, accuracy and reproducibility of the supplied chemical compounds is essential when applying ultrathin layers in the nanometer range.